DocumentCode :
2534922
Title :
Room-temperature reactive bonding by using nano scale multilayer systems
Author :
Braeuer, J. ; Besser, J. ; Wiemer, M. ; Gessner, T.
Author_Institution :
Fraunhofer Inst. for Electron. Nano Syst., Chemnitz, Germany
fYear :
2011
fDate :
5-9 June 2011
Firstpage :
1332
Lastpage :
1335
Abstract :
This paper focuses on room-temperature reactive bonding by using nano scale multilayer systems. The exothermic reaction within the Ti/a-Si multilayer is used as an internal heat source for bonding. Herein, we used lithographical, wet etching and electro-plating procedures to generate very thin integrated reactive multilayer systems. The reaction in the very thin films generated enough heat to self-propagate and to melt tin films. High-speed camera imaging was used to characterize the reaction kinetics and the propagation of the reaction front onto substrates. Furthermore, we demonstrated a strong dependence on substrate material for adhesion after the reaction front has passed.
Keywords :
electroplating; etching; integrated circuit bonding; nanolithography; thin films; adhesion; electroplating procedure; exothermic reaction; high-speed camera imaging; integrated reactive multilayer systems; internal heat source; nanoscale multilayer systems; room-temperature reactive bonding; thin films; wet etching; Adhesives; Heating; Nonhomogeneous media; Silicon; Substrates; Tin; Exothermic reaction; Integrated multilayer systems; Reactive bonding; Ti/a-Si multilayer;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International
Conference_Location :
Beijing
ISSN :
Pending
Print_ISBN :
978-1-4577-0157-3
Type :
conf
DOI :
10.1109/TRANSDUCERS.2011.5969498
Filename :
5969498
Link To Document :
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