Title :
Atomic force microscope based nanomanipulator for mechanical and optical lithography
Author :
Rubio-Sierra, F.J. ; Burghardt, S. ; Kempe, A. ; Heckl, W.M. ; Stark, R.W.
Author_Institution :
Center for Nanosci., Ludwig-Maximilians-Univ., Munich, Germany
Abstract :
An atomic force microscope (AFM) based system has been built for the manipulation of materials at the nanometer scale. The AFM is combined with an inverse optical microscope and an UV-laser microbeam system for photoablation. The actuators of the AFM are controlled using a digital signal processor. Real-time routines and a graphical user interface have been programmed for high resolution imaging and nanomanipulation. The nanomanipulation can be pre-programmed offline or directly performed using a low-cost haptic interface. In this paper, we discuss the whole system and the different methods for manipulation.
Keywords :
actuators; atomic force microscopy; graphical user interfaces; haptic interfaces; laser ablation; manipulators; nanolithography; nanopositioning; photolithography; UV laser microbeam system; actuators; atomic force microscopy based nanomanipulator; digital signal processor; graphical user interface; high resolution imaging; high resolution nanomanipulation; low cost haptic interface; mechanical lithography; nanometer scale materials; optical lithography; optical microscope; photoablation; real-time routines; Actuators; Atom optics; Atomic force microscopy; Digital control; Digital signal processors; Graphical user interfaces; Lithography; Nanostructured materials; Optical materials; Optical microscopy;
Conference_Titel :
Nanotechnology, 2004. 4th IEEE Conference on
Print_ISBN :
0-7803-8536-5
DOI :
10.1109/NANO.2004.1392388
