Title :
Effect of device density on the uniformity of silicon nano-photonic waveguide devices
Author :
Selvaraja, Shankar Kumar ; De Vos, Kristof ; Bogaerts, W. ; Bienstman, Peter ; Van Thourhout, Dries ; Baets, Roel
Abstract :
We report wavelength selective device nonuniformity of 1 nm over a 200 mm SOI wafer using CMOS fabrication technology. We also report correlation between device density and nonuniformity.
Keywords :
CMOS integrated circuits; nanophotonics; optical waveguides; silicon; silicon-on-insulator; CMOS fabrication technology; SOI wafer; Si; device density; silicon nano-photonic waveguide devices; wavelength selective device nonuniformity; CMOS technology; Circuits; Dry etching; Lithography; Nanoscale devices; Optical device fabrication; Optical ring resonators; Optical tuning; Optical waveguides; Silicon; 193nm optical lithography; CMOS photonics; Silicon-on-Insulator;
Conference_Titel :
LEOS Annual Meeting Conference Proceedings, 2009. LEOS '09. IEEE
Conference_Location :
Belek-Antalya
Print_ISBN :
978-1-4244-3680-4
Electronic_ISBN :
1092-8081
DOI :
10.1109/LEOS.2009.5343250
