• DocumentCode
    2535376
  • Title

    Quantized conductance in an in-plane gated In0.53Ga0.47As quantum point contact

  • Author

    Beyer, Andre ; Ferry, David K.

  • Author_Institution
    Dept. of Electr. Eng., Arizona State Univ., Tempe, AZ, USA
  • fYear
    2004
  • fDate
    16-19 Aug. 2004
  • Firstpage
    488
  • Lastpage
    490
  • Abstract
    We report quantized conductance in a 500 nm wide In0.53Ga0.47As quantum point contact defined by 100 nm wide trenches. The surrounding two-dimensional electron gas was used as gate. Electron beam lithography and reactive ion etching with BCl3 formed the trenches. Quantized conductance in steps of 2e2/h as well as one additional step at 0.7(2e2/h) was observed at 4.8 K. Conductance oscillations superimpose the plateaus at 0.3 K. A possible explanation for these resonance structures is a quantum interference of electron waves between the boundaries to the two-dimensional source and drain region.
  • Keywords
    III-V semiconductors; aluminium compounds; current fluctuations; electric admittance; electron beam lithography; electron waveguides; gallium arsenide; indium compounds; nanotechnology; quantum point contacts; sputter etching; two-dimensional electron gas; 0.3 K; 100 nm; 4.8 K; 500 nm; InGaAs-InAlAs; electron beam lithography; electron waves; in-plane gated In0.53Ga0.47As quantum point contact; quantized conductance; quantized conductance oscillation; quantum interference; reactive ion etching; resonance structures; two-dimensional electron gas; two-dimensional source-drain boundaries; Annealing; Contacts; Electrons; Electrostatics; Etching; Indium gallium arsenide; Lithography; Optical buffering; Optical pumping; Optical scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2004. 4th IEEE Conference on
  • Print_ISBN
    0-7803-8536-5
  • Type

    conf

  • DOI
    10.1109/NANO.2004.1392395
  • Filename
    1392395