Title :
Negative-photoresist mechanical property for nano-filtration membrane embedded in microfluidics
Author :
Hirai, Y. ; Uesugi, A. ; Makino, Y. ; Yagyu, H. ; Sugano, K. ; Tsuchiya, T. ; Tabata, O.
Author_Institution :
Dept. of Micro Eng., Kyoto Univ., Kyoto, Japan
Abstract :
We report on a simple UV photolithography based fabrication for an epoxy-based filtration membrane and its primary features such as the permeability and the elastic modulus toward a design of polymer-based microfluidic systems. The elastic modulus of filtration membrane was measured by an indentation test, and then which was evaluated by a cross-linked ratio of epoxy group to clarify the dependence on the process parameters. It was revealed for the first time that the elastic modulus for filtration membrane varied from 3.8 GPa to 4.9 GPa according to the cross-linked ratio of 0.5 to 0.75.
Keywords :
elastic moduli measurement; impact testing; membranes; microfluidics; nanofiltration; nanoindentation; photoresists; resins; ultraviolet lithography; 3D UV photolithography; cross-linked ratio; elastic modulus measurement; epoxy-based filtration membrane fabrication; nanofiltration membrane; nanoindentation test; negative photoresist mechanical property; polymer-based microfluidic system design; Biomembranes; Fabrication; Filtration; Lithography; Microfluidics; Polymers; Resists; 3D UV photolithography; Mechanical property; Membrane; Microfluidics; Nanoindentation;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International
Conference_Location :
Beijing
Print_ISBN :
978-1-4577-0157-3
DOI :
10.1109/TRANSDUCERS.2011.5969546
