• DocumentCode
    2535831
  • Title

    Time predictive model of charge accumulation in bulk PECVD dielectric materials used for electrostatic RF MEMS switches

  • Author

    Souchon, F. ; Koszewski, A. ; Dieppedale, C. ; Ouisse, T.

  • Author_Institution
    CEA-LETI-MINATEC-CAMPUS, Grenoble, France
  • fYear
    2011
  • fDate
    5-9 June 2011
  • Firstpage
    2899
  • Lastpage
    2903
  • Abstract
    This paper presents an original time predictive model to simulate the drift of the pull-in voltage due to dielectric charging for electrostatic MEMS switches. This model of charge accumulation is based on the characterization of the bulk dielectric properties by I-V sweeps and constant current injections performed on Metal-Insulator-Metal capacitors. The model can be successfully used to compare various dielectric materials, and lead to parametric studies without the need of any fitting parameters. Moreover, the simulated switch lifetime results are very promising as they are consistent with experimental data obtained for electrostatic MEMS switches either made with SiNx or SiO2 dielectric materials.
  • Keywords
    MIM devices; dielectric materials; microswitches; microwave switches; plasma CVD; bulk PECVD dielectric material; charge accumulation; constant current injection; electrostatic RF MEMS switch; fitting parameters; metal-insulator-metal capacitor; pull-in voltage; simulated switch lifetime; time predictive model; Charge carrier processes; Dielectrics; Electric fields; Microswitches; Predictive models; Temperature measurement; Voltage measurement; Dielectric charging; charge accumulation; silicon nitride; silicon oxide; trapping kinetics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International
  • Conference_Location
    Beijing
  • ISSN
    Pending
  • Print_ISBN
    978-1-4577-0157-3
  • Type

    conf

  • DOI
    10.1109/TRANSDUCERS.2011.5969565
  • Filename
    5969565