DocumentCode :
2537660
Title :
High reliability high voltage HBTs operating up to 30 V
Author :
Henderson, Tim ; Hitt, John ; Campman, Ken
Author_Institution :
TriQuint Semicond. Texas, Richardson, TX, USA
fYear :
2004
fDate :
24-27 Oct. 2004
Firstpage :
67
Lastpage :
70
Abstract :
This paper reports the reliability characterization of InGaP/GaAs HBTs fabricated with a high voltage process. Breakdown voltages BVceo = 42 V and BVcbo = 72 V are demonstrated, making this technology suitable for 28 V bias in most applications. Proprietary growth, unit cell design, and fabrication techniques ensure that current collapse is not seen at any bias point up to avalanche breakdown. Elevated temperature and current density bias stress tests at 16 V, 20 V, and 30 V show good reliability, with an extrapolated MTTF at nominal bias conditions and 140°C junction temperature of at least 107 hours.
Keywords :
III-V semiconductors; gallium arsenide; heterojunction bipolar transistors; high-voltage techniques; indium compounds; semiconductor device reliability; 140 C; 16 V; 20 V; 28 V; 30 V; 42 V; 72 V; GaAs; InGaP; InGaP-GaAs HBT; breakdown voltage; current collapse; current density bias stress test; elevated temperature test; extrapolated MTTF; high reliability HBT; high voltage HBT; high voltage process; unit cell design; Electric breakdown; Gallium arsenide; Heterojunction bipolar transistors; Low voltage; Materials reliability; Semiconductor device reliability; Semiconductor materials; Stress; Temperature; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductor Integrated Circuit Symposium, 2004. IEEE
ISSN :
1550-8781
Print_ISBN :
0-7803-8616-7
Type :
conf
DOI :
10.1109/CSICS.2004.1392492
Filename :
1392492
Link To Document :
بازگشت