Ultra-strong UV written gratings in PECVD grown Ge doped silica waveguides with no hydrogen loading

Author

Moss, D.J. ; Canning, J. ; Faith, M. ; Leech, P. ; Kemeny, P. ; Poulsen, C.V. ; Leistiko, O.

Author_Institution

Opt. Fibre Technol. Centre, Sydney Univ., NSW, Australia

Volume

2

fYear

1996

fDate

18-21 Nov. 1996

Firstpage

34

Abstract

In this paper we report what we believe to be the strongest waveguide gratings to date written by UV exposure of germanosilicate rib waveguides grown by PECVD, and without the use of hydrogen loading. Gratings of this strength should be more than adequate for fabricating WDM devices.

Keywords

diffraction gratings; germanate glasses; multiplexing equipment; optical communication equipment; optical fabrication; optical glass; optical planar waveguides; optical waveguide components; plasma CVD; rib waveguides; wavelength division multiplexing; Ge doped silica waveguides; PECVD; SiO/sub 2/-GeO/sub 2/; UV exposure; WDM device fabrication; germanosilicate rib waveguides; optical planar waveguides; ultra-strong UV written gratings; waveguide gratings; Australia; Gratings; Hydrogen; Integrated circuit technology; Optical waveguides; Planar waveguides; Polarization; Silicon compounds; Wavelength division multiplexing; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society Annual Meeting, 1996. LEOS 96., IEEE

Conference_Location

Boston, MA, USA

Print_ISBN

0-7803-3160-5

Type

conf

DOI

10.1109/LEOS.1996.571535

Filename

571535