Title :
Wideband AlGaN-GaN HEMTs on SiC for low noise applications
Author :
Wu Lu ; Yang, J.W. ; Khan, M.A. ; Adesida, I.
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
Abstract :
AlGaN-GaN high electron mobility transistors (HEMTs) have attracted attention because of their extremely high current drive capability and high power performance. Although these GaN-based FETs are primarily considered for high power and high temperature applications, it is important to investigate their microwave noise characteristics. Indeed, the only report in literature (Ping et al, Electron. Lett. vol. 36, pp. 175-176, 2000) to date has shown that AlGaN-GaN HEMTs do have respectable noise properties that are comparable to those of AlGaAs-GaAs HEMTs. Specifically, we have recently reported on 0.25 /spl mu/m AlGaN-GaN HEMTs with a minimum noise figure (NF/sub min/) of 0.77 dB at 5 GHz and a NF/sub min/ of 1.06 dB at 10 GHz. These results are quite counter-intuitive to what might be expected due to the material properties, and especially the defect density, of GaN. However, the results do motivate further investigations of the noise properties of AlGaN-GaN HEMTs. In this paper, we report our latest results on DC, RF, and high frequency noise characteristics of AlGaN-GaN HEMTs, demonstrating a record bandwidth of 100 GHz and NF/sub min/ of 0.53 dB at 8 GHz.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; microwave field effect transistors; semiconductor device measurement; semiconductor device noise; wide band gap semiconductors; 0.53 dB; 0.77 dB; 1.06 dB; 10 GHz; 100 GHz; 5 GHz; 8 GHz; AlGaAs-GaAs; AlGaAs-GaAs HEMTs; AlGaN-GaN; AlGaN-GaN HEMT bandwidth; AlGaN-GaN HEMTs; AlGaN-GaN high electron mobility transistors; DC noise characteristics; GaN defect density; GaN material properties; GaN-based FETs; HEMTs; RF noise characteristics; SiC; SiC substrates; current drive capability; high frequency noise characteristics; high power applications; high temperature applications; low noise applications; microwave noise characteristics; minimum noise figure; noise properties; power performance; wideband AlGaN-GaN HEMTs; Aluminum gallium nitride; Electrons; FETs; HEMTs; MODFETs; Noise figure; Noise measurement; Silicon carbide; Temperature; Wideband;
Conference_Titel :
Device Research Conference, 2000. Conference Digest. 58th DRC
Conference_Location :
Denver, CO, USA
Print_ISBN :
0-7803-6472-4
DOI :
10.1109/DRC.2000.877079