Varifocal scanning micro-mirror fabricated from silicon-on-insulator wafer

Author

Sasaki, T. ; Hane, K.

Author_Institution

Dept. of Nanomech., Tohoku Univ., Sendai, Japan

fYear

2011

fDate

5-9 June 2011

Firstpage

570

Lastpage

573

Abstract

We present a varifocal scanning micro-mirror fabricated from silicon-on-insulator wafer. The varifocal scanning micro-mirror consists of a varifocal membrane mirror with a rotational scanning function. The scanner and varifocal mirror are driven by the comb and parallel plate electrostatic actuators, respectively. The mirror rotates 5 degrees at 45V. And the varifocal mirror changes the curvature from -2m^-1 (focal length -128mm) to +2.7m^-1 (focal length +93mm) by applying the voltage from 0V to 50V. The laser beam was incident on the varifocal scanning micro-mirror and it is conformed that the lateral position and spot size of the reflected laser beam is changed simultaneously.

Keywords

electrostatic actuators; laser beam applications; microfabrication; micromirrors; optical scanners; silicon-on-insulator; Si; electrostatic actuators; fabrication; reflected laser beam; rotational scanning function; silicon-on-insulator wafer; varifocal membrane mirror; varifocal scanning micromirror; voltage 0 V to 50 V; Cameras; Lenses; Mirrors; Optical device fabrication; Optical films; Optical sensors; Scanning micro-mirror; Silicon-on-insulator wafer; Varifocal mirror;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International

Conference_Location

Beijing

ISSN

Pending

Print_ISBN

978-1-4577-0157-3

Type

conf

DOI

10.1109/TRANSDUCERS.2011.5969716

Filename

5969716