• DocumentCode
    2539006
  • Title

    Application of BSIMSOI MOSFET model to SOS technology

  • Author

    Roach, James ; Chen, Lee-Wen ; Clarke, Peter ; Rotella, Francis M.

  • Author_Institution
    Peregrine Semicond., San Diego, CA, USA
  • fYear
    2010
  • fDate
    23-25 May 2010
  • Firstpage
    475
  • Lastpage
    478
  • Abstract
    The BSIMSOI model largely dominates the modeling of silicon-on-insulator (SOI) MOSFET technologies. Silicon-on-sapphire (SOS) technology has many of the advantages of SOI for RF and low-power applications, but with enhanced electrical isolation and heat dissipation, among others. We show that BSIMSOI can reasonably describe state-of-the-art SOS devices as well, including partial and full depletion, as long as differences between SOS and SOI technologies are accounted for in the parameter extraction methodology. For RF switch applications, RON and COFF are adequately represented. Also, a spot check at low currents shows that a modeled RF figure of merit, FT, is not unreasonable.
  • Keywords
    MOSFET; semiconductor device models; silicon-on-insulator; BSIMSOI MOSFET; SOS technology; silicon-on-insulator; silicon-on-sapphire; Capacitance measurement; Isolation technology; MOSFET circuits; Parameter extraction; Parasitic capacitance; Physics; Radio frequency; Silicon on insulator technology; Substrates; Switches; BSIMSOI; Silicon on insulator technology; semiconductor device modeling; silicon on sapphire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Radio Frequency Integrated Circuits Symposium (RFIC), 2010 IEEE
  • Conference_Location
    Anaheim, CA
  • ISSN
    1529-2517
  • Print_ISBN
    978-1-4244-6240-7
  • Type

    conf

  • DOI
    10.1109/RFIC.2010.5477359
  • Filename
    5477359