DocumentCode :
2539006
Title :
Application of BSIMSOI MOSFET model to SOS technology
Author :
Roach, James ; Chen, Lee-Wen ; Clarke, Peter ; Rotella, Francis M.
Author_Institution :
Peregrine Semicond., San Diego, CA, USA
fYear :
2010
fDate :
23-25 May 2010
Firstpage :
475
Lastpage :
478
Abstract :
The BSIMSOI model largely dominates the modeling of silicon-on-insulator (SOI) MOSFET technologies. Silicon-on-sapphire (SOS) technology has many of the advantages of SOI for RF and low-power applications, but with enhanced electrical isolation and heat dissipation, among others. We show that BSIMSOI can reasonably describe state-of-the-art SOS devices as well, including partial and full depletion, as long as differences between SOS and SOI technologies are accounted for in the parameter extraction methodology. For RF switch applications, RON and COFF are adequately represented. Also, a spot check at low currents shows that a modeled RF figure of merit, FT, is not unreasonable.
Keywords :
MOSFET; semiconductor device models; silicon-on-insulator; BSIMSOI MOSFET; SOS technology; silicon-on-insulator; silicon-on-sapphire; Capacitance measurement; Isolation technology; MOSFET circuits; Parameter extraction; Parasitic capacitance; Physics; Radio frequency; Silicon on insulator technology; Substrates; Switches; BSIMSOI; Silicon on insulator technology; semiconductor device modeling; silicon on sapphire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radio Frequency Integrated Circuits Symposium (RFIC), 2010 IEEE
Conference_Location :
Anaheim, CA
ISSN :
1529-2517
Print_ISBN :
978-1-4244-6240-7
Type :
conf
DOI :
10.1109/RFIC.2010.5477359
Filename :
5477359
Link To Document :
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