DocumentCode
2539006
Title
Application of BSIMSOI MOSFET model to SOS technology
Author
Roach, James ; Chen, Lee-Wen ; Clarke, Peter ; Rotella, Francis M.
Author_Institution
Peregrine Semicond., San Diego, CA, USA
fYear
2010
fDate
23-25 May 2010
Firstpage
475
Lastpage
478
Abstract
The BSIMSOI model largely dominates the modeling of silicon-on-insulator (SOI) MOSFET technologies. Silicon-on-sapphire (SOS) technology has many of the advantages of SOI for RF and low-power applications, but with enhanced electrical isolation and heat dissipation, among others. We show that BSIMSOI can reasonably describe state-of-the-art SOS devices as well, including partial and full depletion, as long as differences between SOS and SOI technologies are accounted for in the parameter extraction methodology. For RF switch applications, RON and COFF are adequately represented. Also, a spot check at low currents shows that a modeled RF figure of merit, FT, is not unreasonable.
Keywords
MOSFET; semiconductor device models; silicon-on-insulator; BSIMSOI MOSFET; SOS technology; silicon-on-insulator; silicon-on-sapphire; Capacitance measurement; Isolation technology; MOSFET circuits; Parameter extraction; Parasitic capacitance; Physics; Radio frequency; Silicon on insulator technology; Substrates; Switches; BSIMSOI; Silicon on insulator technology; semiconductor device modeling; silicon on sapphire;
fLanguage
English
Publisher
ieee
Conference_Titel
Radio Frequency Integrated Circuits Symposium (RFIC), 2010 IEEE
Conference_Location
Anaheim, CA
ISSN
1529-2517
Print_ISBN
978-1-4244-6240-7
Type
conf
DOI
10.1109/RFIC.2010.5477359
Filename
5477359
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