DocumentCode :
2539452
Title :
Reflectance-based TiO2 photonic crystal sensors
Author :
Huang, Y. ; Pandraud, G. ; Sarro, P.M.
Author_Institution :
DIMES, Delft Univ. of Technol., Delft, Netherlands
fYear :
2011
fDate :
5-9 June 2011
Firstpage :
2682
Lastpage :
2685
Abstract :
Reflectance-based photonic crystal (PC) sensors with ALD TiO2 pillars for sensing materials with different refractive index (RI) are presented here. The relatively high RI, transparency in visible and IR region and chemical stability make TiO2 a promising material for PC sensors for applications in food or biomedical industry. An IC-compatible fabrication technique called Atomic layer deposition ARrays Defined by Etch-back technique (AARDE) is employed to form the high aspect ratios TiO2 nanopillar (240 nm radius and 800 nm pitch) arrays. The optical signals are characterized by means of reflectance other than transmittance, resulting in easier coupling and simpler process steps. High sensitivity of 739.7nm per RI unit is obtained in the 1.4 - 1.6 μm wavelength region.
Keywords :
photonic crystals; reflectivity; sensors; titanium compounds; IR region; TiO2; atomic layer deposition arrays defined by etch-back technique; biomedical industry; chemical stability; nanopillars; reflectance-based photonic crystal sensors; refractive index; size 1.4 mum to 1.6 mum; Optoelectronic and photonic sensors; Photonic crystals; Reflectivity; Refractive index; Silicon; ALD TiO2; Photonic crystals; reflectance; sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference (TRANSDUCERS), 2011 16th International
Conference_Location :
Beijing
ISSN :
Pending
Print_ISBN :
978-1-4577-0157-3
Type :
conf
DOI :
10.1109/TRANSDUCERS.2011.5969771
Filename :
5969771
Link To Document :
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