DocumentCode :
2539842
Title :
A 31-dBm, high ruggedness power amplifier in 65-nm standard CMOS with high-efficiency stacked-cascode stages
Author :
Leuschner, Stephan ; Pinarello, Sandro ; Hodel, Uwe ; Mueller, Jan-Erik ; Klar, Heinrich
Author_Institution :
Tech. Univ. of Berlin, Berlin, Germany
fYear :
2010
fDate :
23-25 May 2010
Firstpage :
395
Lastpage :
398
Abstract :
A novel, high ruggedness power amplifier topology in a 65-nm CMOS technology is proposed. The proposed stacked cascode topology uses only standard devices available in a modern triple-well CMOS process to achieve breakdown voltages of more than 18V. The power amplifier stage delivers 28 dBm output power at a power-added efficiency (PAE) of 69.9% from a 3.6V supply. The saturation gain is 18 dB. A watt-level power amplifier for GSM low-band operation with 31-dBm output power and 61% PAE is presented.
Keywords :
CMOS integrated circuits; power amplifiers; breakdown voltage; gain 18 dB; high efficiency stacked cascode stages; high ruggedness power amplifier topology; power-added efficiency; size 65 nm; stacked cascode topology; standard CMOS technology; voltage 3.6 V; watt-level power amplifier; CMOS technology; Circuit topology; High power amplifiers; Impedance; MOSFETs; Power amplifiers; Power generation; Radio frequency; Radiofrequency amplifiers; Voltage; Breakdown voltage; CMOS; HV device; RF; high efficiency; power amplifier; ruggedness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radio Frequency Integrated Circuits Symposium (RFIC), 2010 IEEE
Conference_Location :
Anaheim, CA
ISSN :
1529-2517
Print_ISBN :
978-1-4244-6240-7
Type :
conf
DOI :
10.1109/RFIC.2010.5477401
Filename :
5477401
Link To Document :
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