DocumentCode
2540109
Title
Effect of fringing field in modeling of subthreshold surface potential in Dual Material Gate(DMG) MOSFETS
Author
De, Swapnadip ; Sarkar, Angsuman ; Mohankumar, N. ; Sarkar, Chandan Kumar
Author_Institution
Dept. of ECE, Meghnad Saha Inst. of Technol., Kolkata
fYear
2008
fDate
20-22 Dec. 2008
Firstpage
148
Lastpage
151
Abstract
An analytical subthreshold surface potential model for Dual Material Gate MOSFET including the effect of inner fringing field is presented, considering surface potential variation with the depth of the channel depletion layer. A pseudo two dimensional method is adopted and a more accurate prediction of surface potential including the fringing field effect is reported.
Keywords
MOSFET; semiconductor device models; surface potential; analytical subthreshold surface potential model; channel depletion layer; dual material gate MOSFET; fringing field; pseudotwo-dimensional method; Analytical models; Differential equations; Electrodes; Gaussian channels; Hot carriers; MOSFETs; Nonuniform electric fields; Parasitic capacitance; Poisson equations; Voltage; DMG MOSFET; Inner Fringing Field; Pseudo 2-D analysis; Surface Potential;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical and Computer Engineering, 2008. ICECE 2008. International Conference on
Conference_Location
Dhaka
Print_ISBN
978-1-4244-2014-8
Electronic_ISBN
978-1-4244-2015-5
Type
conf
DOI
10.1109/ICECE.2008.4769190
Filename
4769190
Link To Document