DocumentCode :
2540591
Title :
Investigation of the neutral-solution etch process for refractive SOE antireflective surfaces
Author :
Maish, Alexander B.
Author_Institution :
Sandia Nat. Lab., Albuquerque, NM, USA
fYear :
1991
fDate :
7-11 Oct 1991
Firstpage :
760
Abstract :
Antireflection of optically clear glass used in photovoltaic concentrator refractive secondary optical elements (SOEs) was investigated using the neutral-solution etch process. Test coupons and SOEs made from barium zinc glass, which does not solarize under ultraviolet exposure, were successfully etched at the center-point process variable conditions at 87°C and 24 hours. Reflectance of the plano-plano coupons dropped from 7.7% to 0.8%, with a corresponding increase in transmission from 91.7% to 98.5%. The etching process uses nonhydrofluoric relatively nontoxic chemicals in a low-cost process well-suited for use by photovoltaic system manufacturers during production
Keywords :
antireflection coatings; etching; semiconductor technology; solar cells; solar energy concentrators; 24 h; 87 degC; AR coatings; concentrator solar cells; etching; neutral-solution etch process; plano-plano coupons; production; reflectance; refractive secondary optical elements; transmission; Barium; Chemical processes; Etching; Glass; Optical refraction; Photovoltaic systems; Reflectivity; Solar power generation; Testing; Zinc;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1991., Conference Record of the Twenty Second IEEE
Conference_Location :
Las Vegas, NV
Print_ISBN :
0-87942-636-5
Type :
conf
DOI :
10.1109/PVSC.1991.169311
Filename :
169311
Link To Document :
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