• DocumentCode
    2540591
  • Title

    Investigation of the neutral-solution etch process for refractive SOE antireflective surfaces

  • Author

    Maish, Alexander B.

  • Author_Institution
    Sandia Nat. Lab., Albuquerque, NM, USA
  • fYear
    1991
  • fDate
    7-11 Oct 1991
  • Firstpage
    760
  • Abstract
    Antireflection of optically clear glass used in photovoltaic concentrator refractive secondary optical elements (SOEs) was investigated using the neutral-solution etch process. Test coupons and SOEs made from barium zinc glass, which does not solarize under ultraviolet exposure, were successfully etched at the center-point process variable conditions at 87°C and 24 hours. Reflectance of the plano-plano coupons dropped from 7.7% to 0.8%, with a corresponding increase in transmission from 91.7% to 98.5%. The etching process uses nonhydrofluoric relatively nontoxic chemicals in a low-cost process well-suited for use by photovoltaic system manufacturers during production
  • Keywords
    antireflection coatings; etching; semiconductor technology; solar cells; solar energy concentrators; 24 h; 87 degC; AR coatings; concentrator solar cells; etching; neutral-solution etch process; plano-plano coupons; production; reflectance; refractive secondary optical elements; transmission; Barium; Chemical processes; Etching; Glass; Optical refraction; Photovoltaic systems; Reflectivity; Solar power generation; Testing; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1991., Conference Record of the Twenty Second IEEE
  • Conference_Location
    Las Vegas, NV
  • Print_ISBN
    0-87942-636-5
  • Type

    conf

  • DOI
    10.1109/PVSC.1991.169311
  • Filename
    169311