• DocumentCode
    2543188
  • Title

    The endurance performance of 0.5/spl mu/m FRAM products

  • Author

    Chu, Fan ; Davenport, Tom

  • Author_Institution
    Ramtron Int. Corp., Colorado Springs, CO
  • fYear
    2005
  • fDate
    10-10 Nov. 2005
  • Lastpage
    47
  • Abstract
    Ferroelectric random access memories (FRAMs) are nonvolatile memory devices that store data by using the bistable switchable polarization state of a ferroelectric material. Ferroelectric thin films exhibit the hysteresis effect of polarization versus applied electrical field (P-E hysteresis loop) to realize its nonvolatile storage capability. FRAM is also known for its high endurance, a fast write speed, and low power consumption. Endurance is defined as the ability of the device to sustain switchable polarization after many switching cycles. It is one of the critical performance characteristics for FRAM applications. Due to the high endurance of FRAM devices, evaluating the endurance behavior in a reasonable amount of time becomes difficult
  • Keywords
    ferroelectric storage; ferroelectric thin films; hysteresis; random-access storage; 0.5 micron; P-E hysteresis loop; bistable switchable polarization state; electrical field; ferroelectric material; ferroelectric random access memories; ferroelectric thin films; hysteresis effect; nonvolatile memory devices; Capacitors; Fatigue; Ferroelectric films; Ferroelectric materials; Nonvolatile memory; Polarization; Random access memory; Testing; Transistors; Zero voltage switching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Memory Technology Symposium, 2005
  • Conference_Location
    Dallas, TX
  • Print_ISBN
    0-7803-9408-9
  • Type

    conf

  • DOI
    10.1109/NVMT.2005.1541392
  • Filename
    1541392