DocumentCode
2543659
Title
Hydrogen in silicon: diffusion and defect passivation
Author
Sopori, Bhushan L. ; Jones, Kim M. ; Deng, XiaoJun ; Matson, R. ; Al-Jassim, M. ; Tsuo, S. ; Doolittle, Alan ; Rohatgi, A.
Author_Institution
Nat. Renewable Energy Lab., Golden, CO, USA
fYear
1991
fDate
7-11 Oct 1991
Firstpage
833
Abstract
Results of studies on hydrogen diffusion and the passivation of crystal defects and impurities in single and polycrystalline silicon obtained from several different vendors are discussed. It is shown that enhanced diffusion of hydrogen can occur in some of these materials, both in the bulk and along grain boundaries, with an effective diffusivity of about an order of magnitude higher than previously reported values. Hydrogen incorporated for defect passivation can induce defects in silicon. These defects and their recombination characteristics are discussed, and it is proposed that these defects pose the ultimate limit on the degree of improvement manifested by a cell. A back-side hydrogenation technique for solar cell passivation is described
Keywords
crystal defects; elemental semiconductors; hydrogen; impurities; passivation; silicon; solar cells; Si:H2 solar cells; back-side hydrogenation; crystal defects; defect passivation; diffusion; grain boundaries; impurities; recombination characteristics; semiconductor; Grain boundaries; Hydrogen; Impurities; Laboratories; Lattices; Passivation; Photovoltaic cells; Renewable energy resources; Silicon; Solar energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1991., Conference Record of the Twenty Second IEEE
Conference_Location
Las Vegas, NV
Print_ISBN
0-87942-636-5
Type
conf
DOI
10.1109/PVSC.1991.169327
Filename
169327
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