• DocumentCode
    2543659
  • Title

    Hydrogen in silicon: diffusion and defect passivation

  • Author

    Sopori, Bhushan L. ; Jones, Kim M. ; Deng, XiaoJun ; Matson, R. ; Al-Jassim, M. ; Tsuo, S. ; Doolittle, Alan ; Rohatgi, A.

  • Author_Institution
    Nat. Renewable Energy Lab., Golden, CO, USA
  • fYear
    1991
  • fDate
    7-11 Oct 1991
  • Firstpage
    833
  • Abstract
    Results of studies on hydrogen diffusion and the passivation of crystal defects and impurities in single and polycrystalline silicon obtained from several different vendors are discussed. It is shown that enhanced diffusion of hydrogen can occur in some of these materials, both in the bulk and along grain boundaries, with an effective diffusivity of about an order of magnitude higher than previously reported values. Hydrogen incorporated for defect passivation can induce defects in silicon. These defects and their recombination characteristics are discussed, and it is proposed that these defects pose the ultimate limit on the degree of improvement manifested by a cell. A back-side hydrogenation technique for solar cell passivation is described
  • Keywords
    crystal defects; elemental semiconductors; hydrogen; impurities; passivation; silicon; solar cells; Si:H2 solar cells; back-side hydrogenation; crystal defects; defect passivation; diffusion; grain boundaries; impurities; recombination characteristics; semiconductor; Grain boundaries; Hydrogen; Impurities; Laboratories; Lattices; Passivation; Photovoltaic cells; Renewable energy resources; Silicon; Solar energy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1991., Conference Record of the Twenty Second IEEE
  • Conference_Location
    Las Vegas, NV
  • Print_ISBN
    0-87942-636-5
  • Type

    conf

  • DOI
    10.1109/PVSC.1991.169327
  • Filename
    169327