Title :
Temperature optimization and characterization of MBE grown GaN thin film on c-plane sapphire Al2O3 (0001) with Ga metallic buffer layer
Author :
Mahmood, Arshad ; Shah, A. ; Abbas, K. ; Raza, Q. ; Mohammad, T. ; Khizar, M. ; Raja, M. Yasin Akhtar
Author_Institution :
Nat. Inst. of Lasers & Optronics (NILOP), Islamabad, Pakistan
Abstract :
Thin film GaN growth on c-plane sapphire (0001) substrate using two-step method by nitrogen plasma assisted MBE is reported. After growth optimization, a low temperature buffer layer was grown followed by the main GaN thin film. The Optical and structural properties of the film were investigated using XRD, Raman spectroscopy, Photospectrometry and in-Situ RHEED. The polycrystalline nature of the grown film containing both wurtzite as well as cubic structures was obtained through XRD. The observed diffused hallo rings in the RHEED pattern confirms polycrystalline structures of the film. Optical band-gap was calculated using spectrophotometry transmission curves. Whereas, the existence of h-GaN and c-GaN phase´s were validated by employing high resolution Raman spectroscopy. These results shows that the LO and TO active vibration modes of GaN were due to wurtzite and cubic phases into p-region.
Keywords :
III-V semiconductors; Raman spectra; X-ray diffraction; alumina; buffer layers; crystal structure; energy gap; gallium compounds; molecular beam epitaxial growth; reflection high energy electron diffraction; semiconductor epitaxial layers; semiconductor growth; spectrophotometry; vibrational modes; wide band gap semiconductors; Al2O3; GaN-Al2O3; MBE grown thin film; Raman spectroscopy; XRD; c-plane sapphire (0001) substrate; cubic structures; diffused hallo rings; high resolution Raman spectroscopy; in-situ RHEED; metallic buffer layer; nitrogen plasma; optical band-gap; optical property; photospectrometry; polycrystalline nature; spectrophotometry transmission curves; structural property; temperature optimization; two-step method; vibration modes; wurtzite structure; Buffer layers; Gallium; Gallium nitride; Optical films; Phonons; Plasma temperature; Substrates; GaN; MBE; Nitrides; RHEED; Raman; Thin Film; XRD;
Conference_Titel :
High-Capacity Optical Networks and Enabling Technologies (HONET), 2010
Conference_Location :
Cairo
Print_ISBN :
978-1-4244-9922-9
DOI :
10.1109/HONET.2010.5715749