DocumentCode :
2544826
Title :
Recent Research and Emerging Challenges in Physical Design for Manufacturability/Reliability
Author :
Lin, Chung-Wei ; Tsai, Ming-Chao ; Lee, Kuang-Yao ; Chen, Tai-Chen ; Wang, Ting-Chi ; Chang, Yao-Wen
Author_Institution :
Graduate Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei
fYear :
2007
fDate :
23-26 Jan. 2007
Firstpage :
238
Lastpage :
243
Abstract :
As IC process geometries scale down to the nanometer territory, the industry faces severe challenges of manufacturing limitations. To guarantee yield and reliability, physical design for manufacturability and reliability has played a pivotal role in resolution and thus yield enhancement for the imperfect manufacturing process. In this paper, we introduce major challenges arising from nanometer process technology, survey key existing techniques for handling the challenges, and provide some future research directions in physical design for manufacturability and reliability.
Keywords :
design for manufacture; integrated circuit reliability; integrated circuit yield; manufacturing processes; nanotechnology; IC process; imperfect manufacturing process; nanometer process technology; physical design for manufacturability; physical design for reliability; yield enhancement; Computer aided manufacturing; Costs; Design engineering; Industrial electronics; Manufacturing industries; Manufacturing processes; Optical distortion; Optical scattering; Reliability engineering; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2007. ASP-DAC '07. Asia and South Pacific
Conference_Location :
Yokohama
Print_ISBN :
1-4244-0629-3
Electronic_ISBN :
1-4244-0630-7
Type :
conf
DOI :
10.1109/ASPDAC.2007.357992
Filename :
4196038
Link To Document :
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