Title :
Porous and RF sputtering InP for portable THz-TDS in pharmaceutical and medical applications
Author :
Sirbu, Lilian ; Ghimpu, Lidia ; Danila, M. ; Muller, Rudolf ; Matei, Adriana ; Comanescu, F. ; Ionescu, Adrian Mihai ; Grigore, Oana ; Dascalu, T. ; Sarua, Andrei
Author_Institution :
Inst. of Electron. Eng. & Nanotechnol. “D. Ghitu”, Chisinau, Moldova
Abstract :
We developed a technology for deposition of metal contacts/wires upon nanoporous InP thin film structures and RF sputtered InP films. Indium phosphide (InP) films were deposited onto glass substrate using RF magnetron sputtering by varying the substrate temperature (50-100°C), under constant argon pressure (6.3·10-3 Bar) and RF power (40-100 W).
Keywords :
III-V semiconductors; glass; indium compounds; nanoporous materials; porous semiconductors; semiconductor thin films; sputter deposition; terahertz waves; InP; RF magnetron sputtering; RF sputtering; THz TDS; glass substrate; medical applications; metal contacts; nanoporous thin film structures; pharmaceutical applications; power 40 W to 100 W; substrate temperature; temperature 50 degC to 100 degC; wires; Antennas; Films; Indium phosphide; Laser beams; Radio frequency; Sputtering;
Conference_Titel :
Semiconductor Conference (CAS), 2013 International
Conference_Location :
Sinaia
Print_ISBN :
978-1-4673-5670-1
Electronic_ISBN :
1545-827X
DOI :
10.1109/SMICND.2013.6688092
