DocumentCode
2549139
Title
Investigations of structural and electronic properties of TiO2-doped layers deposited by hot target reactive magnetron sputtering method
Author
Prociow, E. ; Domaradzki, J. ; Kaczmarck, D.
Author_Institution
Fac. of Microsystem Electron. & Photonics, Wroclaw Univ. of Technol., Poland
fYear
2002
fDate
14-16 Oct. 2002
Firstpage
51
Lastpage
54
Abstract
In the paper structural and thermoelectrical properties of titanium oxides with palladium and gold dopants has been described The thermoelectric effect in the specimen doped by palladium has been found. Growing and nucleation of titanium films during deposition has been also discussed.
Keywords
crystal structure; gold; nucleation; palladium; semiconductor growth; semiconductor thin films; sputtered coatings; thermoelectricity; titanium compounds; transparency; TiO2-doped layers; TiO2:Au; TiO2:Pd; electronic properties; hot target reactive magnetron sputtering method; nucleation; structural properties; thermoelectrical properties; Atmosphere; Crystallization; Diffraction; Gold; Magnetic properties; Optical films; Plasma temperature; Pulsed power supplies; Sputtering; Thermoelectricity;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Devices and Microsystems, 2002. The Fourth International Conference on
Print_ISBN
0-7803-7276-X
Type
conf
DOI
10.1109/ASDAM.2002.1088472
Filename
1088472
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