Title :
Radiation hardness of a large area CMOS active pixel sensor for bio-medical applications
Author :
Esposito, M. ; Anaxagoras, T. ; Diaz, Orlando ; Wells, Kevin ; Allinson, N.M.
Author_Institution :
Centre for Vision, Speech & Signal Process., Univ. of Surrey, Guildford, UK
fDate :
Oct. 27 2012-Nov. 3 2012
Abstract :
A wafer scale CMOS Active Pixel Sensor has been designed employing design techniques of transistor enclosed geometry and P+ doped guard rings to offer ionizing radiation tolerance. The detector was irradiated with 160 kVp X-rays up to a total dose of 94 kGy(Si) and remained functional. The radiation damage produced in the device has been studied, resulting in a dark current density increase per decade of 96±S pA/cm2/decade and a damage threshold of 204 Gy(Si). The damage produced in the detector has been compared with a commercially available CMOS APS, showing a radiation tolerance about 100 times higher. Moreover Monte Carlo simulations have been performed to evaluate primary and secondary energy deposition in each of the detector stages.
Keywords :
CMOS image sensors; Monte Carlo methods; X-ray effects; biomedical engineering; biomedical imaging; radiation hardening; Monte Carlo simulation; P+ doped guard ring; X-ray irradiation; biomedical application; commercially available CMOS APS; damage threshold; dark current density increase; design technique; detector primary energy deposition; detector secondary energy deposition; device radiation damage; ionizing radiation tolerance; large area CMOS active pixel sensor; radiation absorbed dose 204 Gy; radiation absorbed dose 94 kGy; radiation hardness; transistor enclosed geometry; wafer scale CMOS active pixel sensor; APS; CMOS; Fluorescence X-rays; Geant4; Large area image sensors; Monte Carlo simulations; Radiation hardness; semiconductor devices;
Conference_Titel :
Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC), 2012 IEEE
Conference_Location :
Anaheim, CA
Print_ISBN :
978-1-4673-2028-3
DOI :
10.1109/NSSMIC.2012.6551318