Title :
Efficient hydrogen passivation for MIS inversion layer solar cells on multicrystalline silicon
Author :
Jaeger, K. ; Hoffman, W. ; Wilhelm, K. ; Hezel, R.
Author_Institution :
Nukem GmbH, Alzenau, Germany
Abstract :
The effect of hydrogenation on the performance of multicrystalline MIS (metal-insulator-silicon) inversion layer solar cells is demonstrated, and the excellent suitability of their low-temperature fabrication process to hydrogen treatment is shown. It was found that the plasma hydrogenation for the inversion layer cells can be performed on the as-sawn silicon substrates prior to cell processing. In particular, the surface damage layer introduced by the plasma treatment can be completely removed on the bare wafer by an alkaline etchant, and therefore any negative influence on the cell properties is excluded
Keywords :
elemental semiconductors; hydrogen; metal-insulator-semiconductor devices; passivation; silicon; solar cells; MIS inversion layer solar cells; Si:H; hydrogen passivation; hydrogenation; low-temperature fabrication; multicrystalline Si; plasma hydrogenation; semiconductors; surface damage layer; Fabrication; Hydrogen; Metal-insulator structures; Passivation; Photovoltaic cells; Plasma applications; Plasma materials processing; Plasma properties; Silicon; Surface treatment;
Conference_Titel :
Photovoltaic Specialists Conference, 1991., Conference Record of the Twenty Second IEEE
Conference_Location :
Las Vegas, NV
Print_ISBN :
0-87942-636-5
DOI :
10.1109/PVSC.1991.169358