Title :
SCR device for ESD protection in sub-micron triple well silicided CMOS processes
Author :
Salcedo, Javier A. ; Liou, Juin J. ; Bernier, Joseph C.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Central Florida, Orlando, FL, USA
Abstract :
A high-holding-low-trigger-voltage-silicon-controlled-rectifier (HHLVTSCR) is fabricated in a sub-micron triple well CMOS technology in complementary nand p-types. The HHLVTSCRs occupy less area than typical electrostatic discharge (ESD) protection devices and the corresponding I-V characteristics are adjustable to different protection requirements. The characteristics of these devices are tuned by the appropriate choice of the internal dimensions and device interconnections. Both n- and p-type devices are characterized using the transmission line pulse (TLP) technique. Comparisons between n- and p-type devices show that n-type devices perform better than p-type devices for low holding voltages (VH), but for relatively high holding voltages the p-type devices show better characteristics. Results demonstrate that ESD protection capabilities in n- and p-type devices are adequate for the design of multiple IC´s ESD protection schemes with very low leakage current and without latchup concerns.
Keywords :
CMOS integrated circuits; electrostatic discharge; thyristors; ESD protection devices; HHLVTSCR; SCR device; communication transceiver; device interconnections; device internal dimensions; electrostatic discharge; high-holding-low-trigger-voltage silicon-controlled-rectifier; leakage current; n-type device; p-type devices; sub-micron triple well CMOS technology; supply clamp; transmission line pulse technique; CMOS integrated circuits; CMOS process; CMOS technology; Clamps; Electrostatic discharge; Leakage current; Low voltage; Protection; Thyristors; Voltage control;
Conference_Titel :
Devices, Circuits and Systems, 2004. Proceedings of the Fifth IEEE International Caracas Conference on
Print_ISBN :
0-7803-8777-5
DOI :
10.1109/ICCDCS.2004.1393355