Title :
IC layout and manufacturability: critical links and design flow implications
Author :
Kahng, Andrew B.
Author_Institution :
Dept. of Comput. Sci., California Univ., Los Angeles, CA, USA
Abstract :
We assess the prospects for new tools and flows in the interface between layout design and manufacturability. We begin with a review of classic elements of this interface, then focus on more recently critical issues: (i) layout design for reduced CMP variability; (ii) layout design for PSM; and (iii) layout design for OPC. Our discussion highlights the many ways in which layout affords effective means of optimizing manufacturability, as well as opportunities for research and development
Keywords :
chemical mechanical polishing; integrated circuit layout; integrated circuit technology; phase shifting masks; proximity effect (lithography); IC layout; chemical-mechanical polishing; critical link; design flow; manufacturability; optical proximity correction; phase-shifting mask; CMOS technology; Chemical technology; Computer aided manufacturing; Delay; Design optimization; Integrated circuit layout; Manufacturing processes; Plasma materials processing; Research and development; Shape;
Conference_Titel :
VLSI Design, 1999. Proceedings. Twelfth International Conference On
Conference_Location :
Goa
Print_ISBN :
0-7695-0013-7
DOI :
10.1109/ICVD.1999.745132
