DocumentCode :
2552881
Title :
Carbon-based electrical interconnect and thermal interface materials
Author :
Yang, Cary Y.
Author_Institution :
Center for Nanostruct., Santa Clara Univ., Santa Clara, CA
fYear :
2008
fDate :
25-27 Nov. 2008
Abstract :
Summary form only given. As integrated circuit (IC) technology continues the trend towards sub-45 nanometer feature sizes, it is imperative to retain performance of back-end features such as on-chip interconnects while gaining the cost benefit of scaling. Some major barriers to achieving continuous downward scaling include high resistance and questionable reliability of nanoscale copper lines, and power dissipation in densely packed integrated circuits. This work presents fundamental electrical and thermal characterization of carbon nanofibers (CNF) as a possible solution for next-generation back-end integrated circuit processing. Results of temperature-dependent electrical resistance measurements for CNF arrays demonstrate distinct metallic behavior of these novel nanoscale devices. The current capacity of CNF interconnect test structures is examined and the results are compared with an electrothermal transport model. The use of CNF/copper composite material as a thermal interface for IC packaging is explored and fundamental thermal resistance measurement results show promise of such a composite material for thermal management applications.
Keywords :
carbon; composite materials; copper; electrical resistivity; integrated circuit interconnections; nanotechnology; thermal conductivity; C-Cu; IC packaging; back-end integrated circuit processing; carbon nanofibers; composite material; electrical interconnect; electrical resistance; electrothermal transport model; integrated circuit technology; on-chip interconnects; thermal interface materials; thermal resistance; Composite materials; Copper; Electric resistance; Electrical resistance measurement; Integrated circuit interconnections; Integrated circuit technology; Nanocomposites; Organic materials; Thermal management; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Electronics, 2008. ICSE 2008. IEEE International Conference on
Conference_Location :
Johor Bahru
Print_ISBN :
978-1-4244-3873-0
Electronic_ISBN :
978-1-4244-2561-7
Type :
conf
DOI :
10.1109/SMELEC.2008.4770264
Filename :
4770264
Link To Document :
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