• DocumentCode
    2553055
  • Title

    Time optimized implantation modeling for accurate process simulation

  • Author

    Sankar, G. Kulathu ; Pal, Deb Kumar ; Tee, Elizabeth Kho Ching ; Hua, Tia Swee

  • Author_Institution
    X-FAB Sarawak Sdn. Bhd., Kuching
  • fYear
    2008
  • fDate
    25-27 Nov. 2008
  • Firstpage
    38
  • Lastpage
    39
  • Abstract
    In this work an attempt is made to extract Dual Pearson moments from 1-D Monte Carlo simulated profiles, and these moments are used for 2-D simulations. This approach gives same accurate implant profile as Monte Carlo, but simulation time is significantly reduced.
  • Keywords
    Monte Carlo methods; ion implantation; semiconductor process modelling; 1D Monte Carlo simulated profiles; 2D simulations; accurate process simulation; extract dual Pearson moments; time optimized implantation modeling; Implants; Monte Carlo methods;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Electronics, 2008. ICSE 2008. IEEE International Conference on
  • Conference_Location
    Johor Bahru
  • Print_ISBN
    978-1-4244-3873-0
  • Electronic_ISBN
    978-1-4244-2561-7
  • Type

    conf

  • DOI
    10.1109/SMELEC.2008.4770272
  • Filename
    4770272
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2553055