Temporal behavior of microplasma and its coupling phenomena in silicon channel devices

Summary form only given. The spatiotemporal behavior of microplasmas produced with a silicon microchannel device having a transverse electrode structure has been studied by optical microscopy. For the experiments reported here, the microchannels have a width of 50 µm and a depth of ∼30 µm, and are fabricated in a 380 µm thick Si wafer, Along the rim of the channel is deposited a metal film electrode that is periodic having a square wave pattern and an edge-to-edge spacing of 50 µm. The channel and electrodes are overcoated with a multi-dielectric film stack to yield a micro dielectric barrier discharge (DBD) device.