DocumentCode :
2555083
Title :
Study of stochastic heating using particle-in-cell simulation in single frequency capacitively coupled plasma discharges
Author :
Sharma, Sarveshwar ; Turner, Miles
Author_Institution :
National Centre for Plasma Science and Technology, Dublin City University, Dublin 9, Ireland
fYear :
2012
fDate :
8-13 July 2012
Abstract :
Summary form only given. The important phenomenon in low pressure radio-frequency capacitive discharges is stochastic heating. Ohmic heating is not the main source of power absorption. The electrons gain energy by interacting with the high voltage oscillating sheath. This phenomenon has been investigated by different analytical models2,3,4 using several different approaches and has produced results that are broadly in agreement insofar as scaling with the discharge parameters is concerned, but there remains some disagreement in detail concerning the absolute size of the effect. Benchmarking of these analytical models has been done by Kawamura et al.1, using particle-in-cell simulation but the data points are rather small.
Keywords :
Discharges (electric); Fault location; Heating; Plasmas; Radio frequency; Stochastic processes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location :
Edinburgh
ISSN :
0730-9244
Print_ISBN :
978-1-4577-2127-4
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2012.6383392
Filename :
6383392
Link To Document :
بازگشت