DocumentCode
2555083
Title
Study of stochastic heating using particle-in-cell simulation in single frequency capacitively coupled plasma discharges
Author
Sharma, Sarveshwar ; Turner, Miles
Author_Institution
National Centre for Plasma Science and Technology, Dublin City University, Dublin 9, Ireland
fYear
2012
fDate
8-13 July 2012
Abstract
Summary form only given. The important phenomenon in low pressure radio-frequency capacitive discharges is stochastic heating. Ohmic heating is not the main source of power absorption. The electrons gain energy by interacting with the high voltage oscillating sheath. This phenomenon has been investigated by different analytical models2,3,4 using several different approaches and has produced results that are broadly in agreement insofar as scaling with the discharge parameters is concerned, but there remains some disagreement in detail concerning the absolute size of the effect. Benchmarking of these analytical models has been done by Kawamura et al.1, using particle-in-cell simulation but the data points are rather small.
Keywords
Discharges (electric); Fault location; Heating; Plasmas; Radio frequency; Stochastic processes;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location
Edinburgh
ISSN
0730-9244
Print_ISBN
978-1-4577-2127-4
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2012.6383392
Filename
6383392
Link To Document