• DocumentCode
    2555083
  • Title

    Study of stochastic heating using particle-in-cell simulation in single frequency capacitively coupled plasma discharges

  • Author

    Sharma, Sarveshwar ; Turner, Miles

  • Author_Institution
    National Centre for Plasma Science and Technology, Dublin City University, Dublin 9, Ireland
  • fYear
    2012
  • fDate
    8-13 July 2012
  • Abstract
    Summary form only given. The important phenomenon in low pressure radio-frequency capacitive discharges is stochastic heating. Ohmic heating is not the main source of power absorption. The electrons gain energy by interacting with the high voltage oscillating sheath. This phenomenon has been investigated by different analytical models2,3,4 using several different approaches and has produced results that are broadly in agreement insofar as scaling with the discharge parameters is concerned, but there remains some disagreement in detail concerning the absolute size of the effect. Benchmarking of these analytical models has been done by Kawamura et al.1, using particle-in-cell simulation but the data points are rather small.
  • Keywords
    Discharges (electric); Fault location; Heating; Plasmas; Radio frequency; Stochastic processes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
  • Conference_Location
    Edinburgh
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4577-2127-4
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2012.6383392
  • Filename
    6383392