DocumentCode :
255548
Title :
Threshold voltage modeling of GaN based normally-off tri-gate transistor
Author :
Yadav, C. ; Kushwaha, P. ; Agarwal, H. ; Chauhan, Y.S.
Author_Institution :
Dept. of Electr. Eng., Indian Inst. of Technol., Kanpur, Kanpur, India
fYear :
2014
fDate :
11-13 Dec. 2014
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, a behavioral model of threshold voltage for normally-off (enhancement mode) AlGaN/GaN based tri-gate HEMT is proposed. AlGaN/GaN based tri-gate HEMT devices have additional sidewall gates and show threshold voltage variation with decreasing device width. The proposed model captures strain relaxation with reduction in device width, which is one of the primary reason for change in Vth in AlGaN/GaN tri-gate devices. Model shows excellent agreement with state-of-the-art experimental and simulation data.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device models; wide band gap semiconductors; AlGaN-GaN; normally-off trigate transistor; threshold voltage modeling; tri-gate HEMT devices; Aluminum gallium nitride; DH-HEMTs; FinFETs; Gallium nitride;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
India Conference (INDICON), 2014 Annual IEEE
Conference_Location :
Pune
Print_ISBN :
978-1-4799-5362-2
Type :
conf
DOI :
10.1109/INDICON.2014.7030522
Filename :
7030522
Link To Document :
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