DocumentCode

2556997

Title

Discussion Group Summary Interconnect Reliability - with A Focus On Copper

Author

Sullivan, Tim ; Pierce, Don

fYear

1998

fDate

15-15 Oct. 1998

Firstpage

90

Lastpage

91

Keywords

Acceleration; Artificial intelligence; Copper; Electromigration; Metallization; Microelectronics; Rivers; Stress; Testing; Time measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Integrated Reliability Workshop Final Report, 1998. IEEE International

Conference_Location

Lake Tahoe, CA, USA

Print_ISBN

0-7803-4881-8

Type

conf

DOI

10.1109/IRWS.1998.745375

Filename

745375