DocumentCode
2557542
Title
A Baseband Ultra-Low Noise SiGe:C BiCMOS 0.25μm Amplifier and its Application for an On-Chip Phase-Noise Measurement Circuit
Author
Godet, S. ; Tournier, É ; Llopis, O. ; Cathelin, A. ; Juyon, J.
Author_Institution
LAAS-CNRS, Univ. de Toulouse, Toulouse
fYear
2009
fDate
19-21 Jan. 2009
Firstpage
1
Lastpage
4
Abstract
The design and realization of an ultra-low noise operational amplifier is presented. Its applications are integrated low-frequency noise measurements in electronic devices and on- chip phase-noise measurement circuit. This paper discusses the SiGe:C BiCMOS 0.25 mum design improvements used for low noise applications. The proposed three-stage operational amplifier uses parallel bipolar transistor connection as input differential pair for low noise behavior. This operational amplifier provides both low noise and high gain performances. This operational amplifier has an area of only 660 times 250 mum2 with an equivalent input noise floor of only 1.1 nV/ radicHz square root at 10 kHz. The measured noise characteristics (versus total power consumption) are better than those of most operational amplifiers commonly adopted in low-frequency noise measurements. The AC gain is 83 dB and the unity gain bandwidth is 210 MHz, with a total current consumption of 18 mA at 2.5 V supply voltage.
Keywords
BiCMOS digital integrated circuits; Ge-Si alloys; bipolar transistors; carbon; operational amplifiers; phase noise; SiGe:C; bandwidth 210 MHz; baseband ultralow noise BiCMOS operational amplifier; current 18 mA; frequency 10 kHz; gain 83 dB; integrated low-frequency noise measurements; on-chip phase-noise measurement circuit; parallel bipolar transistor connection; size 0.25 mum; voltage 2.5 V; Baseband; BiCMOS integrated circuits; Circuit noise; Integrated circuit measurements; Low-frequency noise; Noise measurement; Operational amplifiers; Phase measurement; Phase noise; Semiconductor device measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Silicon Monolithic Integrated Circuits in RF Systems, 2009. SiRF '09. IEEE Topical Meeting on
Conference_Location
San Diego, CA
Print_ISBN
978-1-4244-3940-9
Electronic_ISBN
978-1-4244-2831-1
Type
conf
DOI
10.1109/SMIC.2009.4770516
Filename
4770516
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