Title :
Fabrication of third order Bragg gratings by UV nanoimprint lithography for optofluidic lasers
Author :
Peroz, C. ; Galas, J.C. ; Shi, J. ; LeGratiet, L. ; Chen, Y.
Author_Institution :
Laboratoire de Photonique et de Nanostructures, CNRS, Marcoussis
Abstract :
Soft UV nanoimprint lithography has be used to fabricate third order Bragg gratings for visible light and microfluidic dye laser operation. Soft stamps has been made by casting a poly-dimethylsiloxane on a silicon mould and a bi-layer imprinting process has used to obtain resist patterns of high density and high aspect ration line-and-space features. After a lift-off of thin nickel film, reactive ion etching was applied to transfer the patterned features into a glass substrate with aspect ratios up to 12. The integration of the fabricated Bragg gratings into a microfluidic chip allowed us to observe laser emission from a dye molecule (Rhodamine 6G) solution of very small volumes (30 to 75 pL), thereby providing a new method of making functioning optofluidic devices
Keywords :
Bragg gratings; dye lasers; metallic thin films; microfluidics; nanolithography; nickel; optical fabrication; photoresists; soft lithography; sputter etching; Rhodamine 6G; bilayer imprinting; lift-off; microfluidic chip; optofluidic lasers; polydimethylsiloxane; reactive ion etching; resist patterns; soft UV nanoimprint lithography; thin nickel film; third order Bragg gratings; Bragg gratings; Casting; Etching; Glass; Microfluidics; Nanolithography; Nickel; Optical device fabrication; Resists; Silicon;
Conference_Titel :
LEOS Summer Topical Meetings, 2006 Digest of the
Conference_Location :
Quebec City, Que.
Print_ISBN :
1-4244-0090-2
DOI :
10.1109/LEOSST.2006.1693982
