DocumentCode :
2559317
Title :
SDG vs ADG with tied and independent gate options in the subthreshold logic for ultra low power applications
Author :
Vaddi, Ramesh ; Dasgupta, S. ; Agarwal, R.P.
Author_Institution :
E&CE Dept., IIT Roorkee, Roorkee, India
fYear :
2009
fDate :
1-2 June 2009
Firstpage :
1
Lastpage :
4
Abstract :
Subthreshold region of operation has gained wide research interest for applications requiring Ultra low power consumption and medium frequency of operation. Double gate MOSFETs are proved to be better candidates for subthreshold operation due to their near ideal subthreshold slope and negligible gate capacitance. However it is not yet clear whether symmetric (SDG) or Asymmetric (ADG) DG with options of Tied (3T) and Independent gates (4T) are optimal for subthreshold circuit design. In this paper, we compare the performance characteristics of SDG and ADG circuits with tied (3T) and Independent gate (4T) options for the subthreshold logic by applying them to some basic logic gates such as NAND, NOR gates for the 32 nm technology node. We also present the performance comparisons of SDG and ADG circuits for subthreshold logic in the presence of supply voltage and temperature variations. We found that 3T ADG circuits offer approximately 13-14% better power consumption, 4-5% better speed and 16-18.3% better PDP than 3TSDG based circuits.
Keywords :
MOSFET; integrated logic circuits; logic design; low-power electronics; threshold logic; ADG circuits; SDG circuits; asymmetric double gate circuit; double gate MOSFET; logic gates; subthreshold circuit design; subthreshold logic; symmetric double gate circuit; ultra low power applications; Capacitance; Circuit synthesis; Energy consumption; Flexible printed circuits; Logic circuits; Logic design; Logic devices; Logic gates; Temperature; Voltage; Asymmetric; Independent gate DGMOSFET (4T); Subthreshold logic; Symmetric; Tied gate (3T)DGMOSFET; ultra low power;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Semiconductor Technology, 2009. IEDST '09. 2nd International Workshop on
Conference_Location :
Mumbai
Print_ISBN :
978-1-4244-3831-0
Electronic_ISBN :
978-1-4244-3832-7
Type :
conf
DOI :
10.1109/EDST.2009.5166106
Filename :
5166106
Link To Document :
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