• DocumentCode
    2560658
  • Title

    Simulation of Porous Layer Sintering During High- Temperature Annealing

  • Author

    Govorukha, T.B. ; Shwartz, N.L. ; Yanovitskaja, Z. Sh ; Zverev, A.V.

  • Author_Institution
    Novosibirsk State Technical University, Novosibirsk, Russia
  • fYear
    2006
  • fDate
    38899
  • Firstpage
    39
  • Lastpage
    43
  • Abstract
    Kinetic of porous layers transformation during annealing was investigated using Monte Carlo simulation. Model with primitive cubic lattice was used for calculations. Time dependence of film evolution rate at initial stage of annealing process was demonstrated to be power type: ~t¿¿ (1/5 < ¿ <1/3). At any porosity film thickness decreases in discrete steps during annealing. The discontinuous change of film thickness takes place when portion of pores simultaneously comes out from the bulk to the surface. Thickness change is about average pore size, and periods between sudden thickness changes far exceed duration of film thickness jumps.
  • Keywords
    Monte Carlo methods; annealing; porosity; porous materials; sintering; Monte Carlo simulation; annealing process; cubic lattice; film evolution rate; high-temperature annealing; pore size; porosity film thickness; porous layer sintering; porous layer transformation; Atomic layer deposition; Kinetic theory; Lattices; Monte Carlo methods; Optical films; Optical materials; Physics; Simulated annealing; Surface morphology; Temperature; Monte Carlo; porous layers; simulation; sintering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Materials, 2006. Proceedings. 7th Annual 2006 International Workshop and Tutorials on
  • Conference_Location
    Novosibirsk, Russia
  • ISSN
    1815-3712
  • Print_ISBN
    5-7782-0646-1
  • Type

    conf

  • DOI
    10.1109/SIBEDM.2006.230303
  • Filename
    1694069