Experimental studies of silicon nitride waveguides fabrication

Author

Kusko, Mihai ; Avram, Andrei ; Dinescu, Adrian ; Kusko, Cristian ; Comanescu, Florin ; Iorga, Carmen ; Muller, Raluca

Author_Institution

Nat. Inst. for R&D in Microtechnol. (IMT), Bucharest, Romania

Volume

1

fYear

2011

fDate

17-19 Oct. 2011

Firstpage

79

Lastpage

82

Abstract

In this paper are summarized the results of the experimental studies regarding the fabrication of silicon nitride waveguides with applications in biosensing. The waveguides have been fabricated with electron beam lithography and reactive ion etching using PMMA and metallic mask, respectively. Surface quality after etching process and the etching rate are evaluated with characterization tools like AFM, SEM and optical thin film metrology. From our studies we conclude that the use of a metallic mask is beneficial for obtaining high quality waveguides with small dimensions.

Keywords

atomic force microscopy; electron beam lithography; optical fabrication; optical films; optical waveguides; scanning electron microscopy; silicon compounds; sputter etching; thin films; AFM; PMMA mask; SEM; Si₃N₄; electron beam lithography; metallic mask; optical thin film metrology; reactive ion etching; silicon nitride waveguide fabrication; surface quality; Etching; Optical device fabrication; Optical waveguides; Silicon; Surface waves; Reactive Ion Etching; Waveguides;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference (CAS), 2011 International

Conference_Location

Sinaia

ISSN

1545-827X

Print_ISBN

978-1-61284-173-1

Type

conf

DOI

10.1109/SMICND.2011.6095719

Filename

6095719