DocumentCode :
2561925
Title :
The Modern Technology for Silicon NanoFET
Author :
Lobanova, Tatiana V. ; Vorontsov, Yaroslav ; Kalinin, Serguei V.
Author_Institution :
Siberian State Univ. of Telecommun. & Informatics, Novosibirsk
fYear :
2006
fDate :
1-5 July 2006
Firstpage :
27
Lastpage :
29
Abstract :
Under consideration are the technological peculiarities of the production and construction of modern field silicon nanotransistors (FSNT), including teracycle transistors (TCT), their performance capabilities and limit properties are analyzed
Keywords :
MOSFET; elemental semiconductors; field effect transistors; silicon; silicon-on-insulator; Si; field silicon nanotransistors; silicon nanoFET; teracycle transistors; Dielectric materials; High K dielectric materials; High-K gate dielectrics; Lattices; MOSFETs; Mass production; Permittivity; Silicon compounds; Silicon on insulator technology; Space technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Materials, 2006. Proceedings. 7th Annual 2006 International Workshop and Tutorials on
Conference_Location :
Erlagol, Altai
ISSN :
1815-3712
Print_ISBN :
5-7782-0646-1
Type :
conf
DOI :
10.1109/SIBEDM.2006.231996
Filename :
1694130
Link To Document :
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