DocumentCode :
2562290
Title :
Wide-bandgap hydrogenated amorphous silicon carbide prepared from an aromatic carbon source
Author :
Nevin, W.A. ; Yamagishi, H. ; Asaoka, K. ; Tawada, Y.
Author_Institution :
Kaneka Corp., Kobe, Japan
fYear :
1991
fDate :
7-11 Oct 1991
Firstpage :
1347
Abstract :
By utilizing the aromatic molecule xylene, hydrogenated amorphous silicon carbide films are prepared for the first time from an aromatic carbon source. Good-quality films are obtained, over a wide range of optical bandgaps from 2.2 to 3.5 eV and carbon content from 0.4 to 0.9 atomic fraction. Infrared measurements indicate that the films contain a large amount of aromatic and olefinic sp2 carbon bonding, the extent of which depends strongly on the deposition conditions. This unsaturated carbon imparts an unusual property to the material in that it can be doped with an electron acceptor, which increases the electrical conductivity by several orders of magnitude, in a manner similar to organic semiconductors
Keywords :
amorphous semiconductors; bonds (chemical); electrical conductivity of amorphous semiconductors and insulators; energy gap; hydrogen; optical constants; plasma CVD; semiconductor doping; semiconductor growth; semiconductor thin films; silicon compounds; 2.2 to 3.5 eV; IR; SiC:H; amorphous semiconductor thin films; aromatic molecule xylene; bonding; deposition; doping; electrical conductivity; electron acceptor; measurements; optical bandgaps; plasma CVD; Amorphous silicon; Atom optics; Atomic layer deposition; Atomic measurements; Bonding; Conducting materials; Optical films; Organic materials; Photonic band gap; Semiconductor films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1991., Conference Record of the Twenty Second IEEE
Conference_Location :
Las Vegas, NV
Print_ISBN :
0-87942-636-5
Type :
conf
DOI :
10.1109/PVSC.1991.169427
Filename :
169427
Link To Document :
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