Title :
A combined X-ray and optical interferometer with a new translation stage
Author :
Nakayama, K. ; Tanaka, M. ; Kuroda, K.
Author_Institution :
Nat. Res. Lab. of Metrol., Ibaraki, Japan
Abstract :
A novel translation stage with an 80- mu m stroke has been made for the measurement of silicon
Keywords :
X-ray apparatus; elemental semiconductors; lattice dynamics; light interferometers; silicon; Si; X-ray interference signal; X-ray/optical interferometer; autocollimator; guiding error; interference signal; mechanical vibration amplitude; translation stage; Crystals; Goniometers; Interference; Lattices; Optical interferometry; Peak to average power ratio; Resonance; Resonant frequency; Silicon; Voltage;
Conference_Titel :
Precision Electromagnetic Measurements, 1990. CPEM '90 Digest., Conference on
Conference_Location :
Ottawa, Ontario, Canada
DOI :
10.1109/CPEM.1990.109993
