DocumentCode
2562333
Title
A combined X-ray and optical interferometer with a new translation stage
Author
Nakayama, K. ; Tanaka, M. ; Kuroda, K.
Author_Institution
Nat. Res. Lab. of Metrol., Ibaraki, Japan
fYear
1990
fDate
11-14 June 1990
Firstpage
210
Lastpage
211
Abstract
A novel translation stage with an 80- mu m stroke has been made for the measurement of silicon
Keywords
X-ray apparatus; elemental semiconductors; lattice dynamics; light interferometers; silicon; Si; X-ray interference signal; X-ray/optical interferometer; autocollimator; guiding error; interference signal; mechanical vibration amplitude; translation stage; Crystals; Goniometers; Interference; Lattices; Optical interferometry; Peak to average power ratio; Resonance; Resonant frequency; Silicon; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Precision Electromagnetic Measurements, 1990. CPEM '90 Digest., Conference on
Conference_Location
Ottawa, Ontario, Canada
Type
conf
DOI
10.1109/CPEM.1990.109993
Filename
109993
Link To Document