DocumentCode :
2562687
Title :
Large random telegraph noise in sub-threshold operation of nano-scale nMOSFETs
Author :
Campbell, J.P. ; Yu, L.C. ; Cheung, K.P. ; Qin, J. ; Suehle, J.S. ; Oates, A. ; Sheng, K.
Author_Institution :
Semicond. Electron. Div., Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
fYear :
2009
fDate :
18-20 May 2009
Firstpage :
17
Lastpage :
20
Abstract :
We utilize low-frequency noise measurements to examine the sub-threshold voltage (sub-VTH) operation of highly scaled devices. We find that the sub-VTH low-frequency noise is dominated by random telegraph noise (RTN). The RTN is exacerbated both by channel dimension scaling and reducing the gate overdrive into the sub-VTH regime. These large RTN fluctuations greatly impact circuit variability and represent a troubling obstacle that must be solved if sub-VTH operation is to become a viable solution for low-power applications.
Keywords :
MOSFET; low-power electronics; nanoelectronics; channel dimension scaling; circuit variability; gate overdrive; highly scaled devices; low-frequency noise measurements; nanoscale nMOSFETs; random telegraph noise; subVTH low-frequency noise; subthreshold operation; subthreshold voltage operation; Circuit noise; Circuit simulation; Fluctuations; Low-frequency noise; MOSFETs; Noise reduction; Random access memory; Semiconductor device noise; Telegraphy; Voltage; RTN; Sub-VTH operation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
IC Design and Technology, 2009. ICICDT '09. IEEE International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
978-1-4244-2933-2
Electronic_ISBN :
978-1-4244-2934-9
Type :
conf
DOI :
10.1109/ICICDT.2009.5166255
Filename :
5166255
Link To Document :
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