• DocumentCode
    2563063
  • Title

    Fluid simulation of the electromagnetic effects and the phase shift effect in Ar/CF4 capacitively coupled plasmas

  • Author

    Yu-Ru Zhang ; You-Nian Wang ; Bogaerts, A.

  • Author_Institution
    Sch. of Phys. & Optoelectron. Technol., Dalian Univ. of Technol., Dalian, China
  • fYear
    2012
  • fDate
    8-13 July 2012
  • Abstract
    Summary form only given. A two-dimensional self-consistent fluid model combined with the full set of Maxwell equations is established to investigate the electromagnetic effects and the phase shift effect on the plasma characteristics in an Ar/CF4 capacitively coupled plasma at various discharge conditions. The results indicate that the plasma density evolves to a different distribution when the electromagnetic effects are included in the model comparing with the results calculated with the so called electrostatic model (without taking into account the electromagnetic effects), especially at very high frequencies. Therefore, the electromagnetic effects should be taken into account for obtaining realistic results in the simulations when the frequency is in the VHF regime. Moreover, when the frequency is higher than 60 MHz, the standing-wave effect and skin effect become important, and accordingly limit the plasma spatial uniformity [Lieberman, M.A., et al., 2002]. Therefore, the phase-shift control has been presented as an effective method to increase the plasma uniformity considerably in the dual-frequency plasmas [Bera, K., et al., 2007]. The results indicate that when the phase difference increases from 0 to π, the plasma density profiles shift smoothly from edge-peaked over uniform to centre-peaked. But a better uniformity is obtained at different phase shift values when the discharge frequency or the CF4 fraction in Ar/CF4 mixtures is different.
  • Keywords
    Maxwell equations; argon; electrostatics; gas mixtures; organic compounds; plasma Langmuir waves; plasma density; plasma simulation; plasma transport processes; 2D self consistent fluid model; Ar; Ar-CF4 capacitively coupled plasmas; CF4 fraction; dual frequency plasmas; electromagnetic effects; electrostatic model; fluid simulation; phase shift effect; plasma characteristics; plasma density; plasma spatial uniformity; skin effect; standing wave effect; Argon; Discharges (electric); Educational institutions; Electromagnetics; Mathematical model; Plasmas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
  • Conference_Location
    Edinburgh
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4577-2127-4
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2012.6383808
  • Filename
    6383808