DocumentCode
2563063
Title
Fluid simulation of the electromagnetic effects and the phase shift effect in Ar/CF4 capacitively coupled plasmas
Author
Yu-Ru Zhang ; You-Nian Wang ; Bogaerts, A.
Author_Institution
Sch. of Phys. & Optoelectron. Technol., Dalian Univ. of Technol., Dalian, China
fYear
2012
fDate
8-13 July 2012
Abstract
Summary form only given. A two-dimensional self-consistent fluid model combined with the full set of Maxwell equations is established to investigate the electromagnetic effects and the phase shift effect on the plasma characteristics in an Ar/CF4 capacitively coupled plasma at various discharge conditions. The results indicate that the plasma density evolves to a different distribution when the electromagnetic effects are included in the model comparing with the results calculated with the so called electrostatic model (without taking into account the electromagnetic effects), especially at very high frequencies. Therefore, the electromagnetic effects should be taken into account for obtaining realistic results in the simulations when the frequency is in the VHF regime. Moreover, when the frequency is higher than 60 MHz, the standing-wave effect and skin effect become important, and accordingly limit the plasma spatial uniformity [Lieberman, M.A., et al., 2002]. Therefore, the phase-shift control has been presented as an effective method to increase the plasma uniformity considerably in the dual-frequency plasmas [Bera, K., et al., 2007]. The results indicate that when the phase difference increases from 0 to π, the plasma density profiles shift smoothly from edge-peaked over uniform to centre-peaked. But a better uniformity is obtained at different phase shift values when the discharge frequency or the CF4 fraction in Ar/CF4 mixtures is different.
Keywords
Maxwell equations; argon; electrostatics; gas mixtures; organic compounds; plasma Langmuir waves; plasma density; plasma simulation; plasma transport processes; 2D self consistent fluid model; Ar; Ar-CF4 capacitively coupled plasmas; CF4 fraction; dual frequency plasmas; electromagnetic effects; electrostatic model; fluid simulation; phase shift effect; plasma characteristics; plasma density; plasma spatial uniformity; skin effect; standing wave effect; Argon; Discharges (electric); Educational institutions; Electromagnetics; Mathematical model; Plasmas;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location
Edinburgh
ISSN
0730-9244
Print_ISBN
978-1-4577-2127-4
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2012.6383808
Filename
6383808
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