• DocumentCode
    2563269
  • Title

    Floating potential of an isolated macroparticle in vacuum arc deposition plasmas

  • Author

    Junjia, He ; Chun, LIU ; Jiyan, Zou ; Lichun, Cheng

  • Author_Institution
    Dept. of Electr. Power Eng., Huazhong Univ. of Sci. & Technol., Wuhan, China
  • Volume
    2
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    575
  • Abstract
    The vacuum arc deposition (VAD) plasma, as a cathode governed plasma, is not in a local thermal equilibrium state in nature, and the ions emitted from the cathode arc spots characterize high directed velocity in excess of their thermal value. Taking this special feature into account, the charging characteristics of an isolated macroparticle immersed in a VAD plasma are analyzed. The floating potentials of the macroparticles as a result of charging are calculated under thin and thick sheath case
  • Keywords
    cathodes; electric potential; ion emission; plasma CVD; plasma sheaths; vacuum deposition; cathode arc spots; cathode governed plasma; floating potential; isolated macroparticle; local thermal equilibrium state; thermal value; thick sheath; thin sheath; vacuum arc deposition plasmas; Cathodes; Electrons; Nuclear and plasma sciences; Plasma properties; Plasma sheaths; Space technology; Substrates; Surface charging; Vacuum arcs; Vacuum technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 2000. Proceedings. ISDEIV. XIXth International Symposium on
  • Conference_Location
    Xi´an
  • Print_ISBN
    0-7803-5791-4
  • Type

    conf

  • DOI
    10.1109/DEIV.2000.879054
  • Filename
    879054