Title :
An external circuit model for electromagnetic particle-in-cell simulations
Author :
Lin, M.C. ; Zhou, C.D. ; Smithe, David N.
Author_Institution :
Tech-X Corp., Boulder, CO, USA
Abstract :
Summary form only given. In general, the operating characteristics of RF vacuum electronic or plasma devices are affected by the power supply, e.g., a pushing effect on the oscillating frequency of a magnetron by a supplied anode current. The external impedance connected to the system under study should be included in the electromagnetic (EM) particle-in-cell (PIC) simulations especially when the system is in a transient state or characterized with a dynamic impedance. In this work, an algorithm for coupling external circuit elements to EM PIC simulations is developed. The circuit equation including an external voltage Vs or current source Is, resistance R, inductance L, capacitance C, and the dynamic load (I-V) is solved simultaneously with the EM PIC updaters through an instant measured voltage V across the system to obtain the supplied current I for feeding into the system. This external circuit model is under testing and will be implemented in a 3D conformal finite-difference time-domain PIC code, VORPAL.
Keywords :
finite difference time-domain analysis; plasma oscillations; plasma simulation; vacuum microelectronics; 3D conformal finite-difference time-domain PIC code; EM PIC updaters; RF vacuum electronic devices; VORPAL; algorithm; coupling external circuit elements; dynamic impedance; electromagnetic particle-in-cell simulations; external circuit model; external impedance; magnetron; oscillating frequency; plasma devices; supplied anode current; transient state; Electromagnetics; Impedance; Integrated circuit modeling; Load modeling; Mathematical model; Plasmas; Voltage measurement;
Conference_Titel :
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location :
Edinburgh
Print_ISBN :
978-1-4577-2127-4
Electronic_ISBN :
0730-9244
DOI :
10.1109/PLASMA.2012.6383818