Surface structure formation by means of plasma oscillations. Numerical simulation and the principal regularities

Author

Levchenko, I.G.

Author_Institution

Dept. of Robotics, Kharkov State Aerosp. Univ., Ukraine

Volume

2

fYear

2000

fDate

2000

Firstpage

586

Abstract

Numerical simulation of a new method proposed previously for plasma deposition allowing creation of the unique surface structures was carried out. The primary mechanisms were studied and the surface structures were calculated. The present paper describes: model of numerical simulation and conditions of digitization, the set of surface structures calculated, boundary conditions, numerical studying of an electrical field distribution in the oscillation area, numerically calculated ion traces and distribution of ion precipitation to the substrate under plasma oscillation area. The investigation proposed contains the recommendations with respect to experimental investigations being planned, and possible advantages of a new technique for complex surface structure formation with no mask used

Keywords

electric fields; ion beam assisted deposition; plasma deposition; plasma oscillations; surface structure; boundary conditions; complex surface structure formation; digitization; electrical field distribution; ion precipitation distribution; ion traces; numerical simulation; plasma deposition; plasma oscillations; primary mechanisms; surface structure formation; surface structures; Equations; Lenses; Numerical simulation; Plasma density; Plasma properties; Plasma simulation; Plasma waves; Substrates; Surface structures; Surface waves;

fLanguage

English

Publisher

ieee

Conference_Titel

Discharges and Electrical Insulation in Vacuum, 2000. Proceedings. ISDEIV. XIXth International Symposium on

Conference_Location

Xi´an

Print_ISBN

0-7803-5791-4

Type

conf

DOI

10.1109/DEIV.2000.879057

Filename

879057