Title :
Ion current distribution produced by a vacuum arc carbon plasma source
Author :
Zhitomirsky, V.N. ; Zarchin, O. ; Wang, S.G. ; Boxman, R.L. ; Goldsmith, S.
Author_Institution :
Electr. Discharge & Plasma Lab., Tel Aviv Univ., Israel
Abstract :
A vacuum arc carbon plasma source is described, in which an arc was ignited between a cathode and an anode having an aperture, by bringing the two electrodes into contact, and parting them while current was flowing. The inter-electrode gap length was varied. A focusing magnetic field was applied in the inter-electrode gap, and a toroidal magnetic field was applied to guide plasma through a toroidal duct. The influence of the arc current (Iarc), gap length (L), and focusing magnetic field (Bf) on the cathode spot motion, plasma behavior and output ion current was studied. It was shown that with Iarc=150-250 A and relatively weak Bf, the spots moved on the cathode periphery, causing noisy arcing and fluctuation of the output ion current, while at lower Iarc=50-100 A and strong Bf⩾28 mT the number of the spots on the cathode surface decreased, and they tended to move towards the cathode center, decreasing the arc noise and increasing the average output ion current. With increasing L from 2 to 18 mm, the total ion current at first rapidly increased, and then saturated at L⩾10 mm
Keywords :
anodes; carbon; cathodes; current distribution; magnetic fields; plasma production; vacuum arcs; 150 to 250 A; 2 to 18 mm; 50 to 100 A; anode; arc current; arc ignition; arc noise; cathode spot motion; focusing magnetic field; gap length; inter-electrode gap; inter-electrode gap length; ion current distribution; plasma behavior; toroidal duct; toroidal magnetic field; vacuum arc carbon plasma source; Anodes; Apertures; Cathodes; Current distribution; Ducts; Electrodes; Fluctuations; Plasma sources; Toroidal magnetic fields; Vacuum arcs;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 2000. Proceedings. ISDEIV. XIXth International Symposium on
Conference_Location :
Xi´an
Print_ISBN :
0-7803-5791-4
DOI :
10.1109/DEIV.2000.879075