• DocumentCode
    2563942
  • Title

    Atmospheric pressure micro plasma

  • Author

    Myoungsoo Yun ; Ihyun Cho ; Taehoon Jo ; Donghae Kim ; Intae Kim ; Eunha Choi ; Buil Jeon ; Guangsup Cho ; Gichung Kwon

  • Author_Institution
    Dept. of Electrophys., Kwangwoon Univ., Seoul, South Korea
  • fYear
    2012
  • fDate
    8-13 July 2012
  • Abstract
    Summary form only given. Generally, thermal doping method by furnace is used for solar-cell wafer doping. But it takes a lot of time and requires very expensive equipment.
  • Keywords
    atmospheric pressure; plasma jets; plasma materials processing; semiconductor doping; solar cells; P-type wafer doping; atmospheric pressure microplasma jet; solar cell; thermal doping method; Chemistry; Doping; Educational institutions; Photovoltaic cells; Plasmas; Surface resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
  • Conference_Location
    Edinburgh
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4577-2127-4
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2012.6383848
  • Filename
    6383848
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2563942