Title :
Atmospheric pressure micro plasma
Author :
Myoungsoo Yun ; Ihyun Cho ; Taehoon Jo ; Donghae Kim ; Intae Kim ; Eunha Choi ; Buil Jeon ; Guangsup Cho ; Gichung Kwon
Author_Institution :
Dept. of Electrophys., Kwangwoon Univ., Seoul, South Korea
Abstract :
Summary form only given. Generally, thermal doping method by furnace is used for solar-cell wafer doping. But it takes a lot of time and requires very expensive equipment.
Keywords :
atmospheric pressure; plasma jets; plasma materials processing; semiconductor doping; solar cells; P-type wafer doping; atmospheric pressure microplasma jet; solar cell; thermal doping method; Chemistry; Doping; Educational institutions; Photovoltaic cells; Plasmas; Surface resistance;
Conference_Titel :
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location :
Edinburgh
Print_ISBN :
978-1-4577-2127-4
Electronic_ISBN :
0730-9244
DOI :
10.1109/PLASMA.2012.6383848
