DocumentCode :
2564563
Title :
Custom tailored ion energy distribution functions online for everybody
Author :
Predki, Martin ; Shihab, Mohammed ; Wollny, Alexander ; Brinkmann, Ralf Peter
Author_Institution :
Inst. for Theor. Electr. Eng., Ruhr-Univ. Bochum, Bochum, Germany
fYear :
2012
fDate :
8-13 July 2012
Abstract :
Plasma processes, particularly plasma etching and plasma deposition processes are crucial for a large variety of industrial manufacturing processes. For these processes the knowledge of the ion energy distribution function plays a key role. Measurements of the ion energy distribution function (IEDF) are at least challenging and often impossible in industrial processes. An alternative to measurements of the IEDF are simulations.
Keywords :
manufacturing processes; plasma deposition; sputter etching; IEDF; custom tailored ion energy distribution functions; industrial manufacturing process; plasma deposition; plasma etching; plasma process; Distribution functions; Educational institutions; Electrical engineering; Etching; Manufacturing processes; Plasma measurements; Plasmas;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location :
Edinburgh
ISSN :
0730-9244
Print_ISBN :
978-1-4577-2127-4
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2012.6383885
Filename :
6383885
Link To Document :
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