• DocumentCode
    2564907
  • Title

    Monolithic integrated optoelectronic transmitter on GaAs with fully RIE GRINSCH laser diode

  • Author

    Svilans, M. ; Lester, T. ; Fox, Kevin ; Mandeville, P. ; Maritan, C. ; Postolek, H. ; SpringThorpe, A.J.

  • Author_Institution
    Bell-Northern Res., Ottawa, Ont., Canada
  • fYear
    1988
  • fDate
    6-9 Nov. 1988
  • Firstpage
    19
  • Lastpage
    22
  • Abstract
    A fully functioning optoelectronic integrated circuit, a transmitter comprising an AlGaAs GRINSCH (graded-index separate confinement heterostructure) laser diode (LD), a back facet monitor diode, and a driving circuit made up of four MESFETs, has been successfully fabricated. The flexibility that can be attained with facets completely fabricated by reactive ion etching (RIE) is demonstrated on mutually perpendicular stripe lasers side-by-side on the same wafer. The circuits were made on semi-insulating GaAs wafers using two separate MBE (molecular-beam epitaxy) growth runs for the MESFETs and the laser diodes, respectively. More than 50% of the integrated circuits on the 3" wafer were fully functional, although some variation of the FET threshold voltage, transconductance, and the gain-guided LD threshold current was observed. Typical values were -1.5 V, 98 mS/mm, and 100 mA, respectively. Measured speeds of operation exceeded 1 Gb/s.<>
  • Keywords
    III-V semiconductors; aluminium compounds; field effect integrated circuits; gallium arsenide; integrated circuit technology; integrated optoelectronics; optical communication equipment; semiconductor junction lasers; -1.5 V; 1 Gbit/s; 100 mA; 3 in; AlGaAs; FET threshold voltage; GRINSCH laser diode; GaAs; MBE; MESFETs; OEIC; RIE; back facet monitor diode; driving circuit; gain-guided LD threshold current; molecular-beam epitaxy; mutually perpendicular stripe lasers; optoelectronic integrated circuit; reactive ion etching; semi-insulating GaAs wafers; semiconductors; transconductance; Diode lasers; Etching; FET integrated circuits; Gallium arsenide; Integrated optoelectronics; MESFET integrated circuits; Molecular beam epitaxial growth; Monitoring; Threshold voltage; Transmitters;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1988. Technical Digest 1988., 10th Annual IEEE
  • Conference_Location
    Nashville, Tennessee, USA
  • Type

    conf

  • DOI
    10.1109/GAAS.1988.11014
  • Filename
    11014