DocumentCode :
2566396
Title :
Design and fabrication of micromechanical logic elements
Author :
Bergstrom, P. ; Tamagawa, T. ; Polla, D.
Author_Institution :
Dept. of Electr. Eng., Minnesota Univ., Minneapolis, MN, USA
fYear :
1990
fDate :
11-14 Feb 1990
Firstpage :
15
Lastpage :
20
Abstract :
The development of a complete micromechanical digital logic family fabricated for use in low speed applications requiring radiation immunity is presented. The micromachined devices operate by electronic linear actuation of a slider element restricted to a one-dimensional track. A novel feature of the device is the use of a sliding electrical contact. The basic structure of the device is fabricated using three LPCVD polysilicon and two sacrificial oxide deposition steps. The micromechanical logic element demonstrates robust electrical characteristics and has an operating threshold of apparently 15 volts
Keywords :
chemical vapour deposition; logic design; logic devices; 15 V; LPCVD; digital logic family; electrical characteristics; electronic linear actuation; micromachined devices; micromechanical logic elements; one-dimensional track; operating threshold; polysilicon; radiation immunity; sacrificial oxide deposition; slider element; sliding electrical contact; Circuits; Contacts; Electrodes; Electrostatics; Fabrication; Geometry; Inverters; Logic design; Logic devices; Micromechanical devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 1990. Proceedings, An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE
Conference_Location :
Napa Valley, CA
Type :
conf
DOI :
10.1109/MEMSYS.1990.110239
Filename :
110239
Link To Document :
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