Title :
Crystallographic analysis of TiNi shape memory alloy thin film for microactuator
Author :
Ikuta, Koji ; Fujita, Hiroyuki ; Ikeda, Michiaki ; Yamashita, Shinji
Author_Institution :
Fac. of Eng., Tokyo Univ., Japan
Abstract :
Basic research for the micro actuator using TiNi shape-memory alloy (SMA) is conducted from the crystallographic point of view. SMA (TiNi) thin film is fabricated by sputtering deposition. The influence of substrate temperature on crystal structure is verified by measuring resistivity-temperature characteristics and X-ray diffraction. Sputtered TiNi thin film under a low-temperature substrate condition showed amorphous structure. However, thin film sputtered at a high-temperature condition had a crystal lattice, and showed similar phase transformation characteristics as regular bulk TiNi. The results of applying electric current into amorphous TiNi film show that though annealing can encourage crystallization, it is not sufficient
Keywords :
X-ray diffraction examination of materials; crystallisation; electric actuators; nickel alloys; shape memory effects; sputtered coatings; titanium alloys; Ti-Ni; X-ray diffraction; amorphous structure; annealing; crystal lattice; crystallographic analysis; microactuator; phase transformation characteristics; resistivity-temperature characteristics; shape-memory alloy; sputtered coatings; sputtering deposition; Amorphous materials; Crystallization; Crystallography; Microactuators; Shape memory alloys; Sputtering; Substrates; Temperature; Transistors; X-ray diffraction;
Conference_Titel :
Micro Electro Mechanical Systems, 1990. Proceedings, An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots. IEEE
Conference_Location :
Napa Valley, CA
DOI :
10.1109/MEMSYS.1990.110243
